Film forming polymeric compositions of 7,7-dimethyl-7h-dibenzo (c,h)xanthene compounds

ABSTRACT

Novel monomers of 7,7-dimethyl-7H-dibenzo(c,h)xanthene-5,9disulfonyl halide and novel high molecular weight polymers containing 7,7-dimethyl-7H-dibenzo-(c,h)xanthene residues are useful in the preparation of photographic film bases.

United States Patent 11 1 Hamb et al.

1 1 Jan. 7, 1975 1 1 FILM FORMING POLYMERIC COMPOSITIONS OF 7,7-DIMETHYL-7H-DIBENZO [c,h]XANTHENE COMPOUNDS [75] Inventors: Frederick L. Hamb; John C. Wilson,

both of Rochester, NY.

[73] Assignee: Eastman Kodak Company,

Rochester, NY.

[22] Filed: Mar. 18, 1974 [21] Appl. No.: 452,299

Related US. Application Data [63] Continuation of Ser. No. 331,134, Feb. 9, 1973, abandoned, Continuation-impart of Ser. No. 158,525, June 30, 1971, abandoned.

1521 U.S.C1 260/49, 96/114, 117/161K, 1 117/161 1m, 260/47 0, 260/335 151 1m.c1 C08g 17/06, C08g 17/08 [58] Field of Search 260/47 C, 49, 78 R, 47 CZ,

Primary ExaminerLester L. Lee Attorney, Agent, or FirmA. H. Rosenstein 1 71 ABSTRACT Novel monomers of 7,7-dimethy1-7H- dibenzo[c,h]xanthene-5,9-disulf0nyl halide and novel high molecular weight polymers containing 7,7- dimethy1-7H-dibenzo-[c,hlxanthene residues are useful in the preparation of photographic film bases.

14 Claims, N0 Drawings FILM FORMING POLYMERIC COMPOSITIONS OF 7,7-DIMETHYL-7H -DI BENZQ V [C,H]XANTHENE COMPOUNDS This application is a continuation of US Ser. No. 331,134, filed Feb. 9, 1973 now abandoned.

FIELD OF THE INVENTION This invention relates generally to novel monomers and to novel film-forming, polymeric compounds prepared by condensation reactions, and more particularly to novel film-forming, linear condensation polymers comprising residues of a bifunctional derivative of 7,7- dimethyl-7H-dibenzo[c,h]xanthene which polymers are usedas supports for photographic emulsions.

BACKGROUND OF THE INVENTION There is a continuing demand for low cost filmforming materials with improved physical properties which can be used as supports for photographic elements. Currently available film-forming compositions that retain good physical characteristics at temperatures above about 200C have not found general acceptance because their manufacture involves expensive materials or difficult procedures.

SUMMARY OF THE INVENTION It is therefore an object of this invention to provide a novel class of linear condensation polymers and copolymers comprising the residue of condensation polymers and copolymers comprising residues of a bifunctional 7,7-dimethyl-7H-dibenzo [c,h]xanthene which have improved physical properties such as high glass transition temperatures (Tg) and dimensional stability. Another object of this invention is to provide novel linear condensation polymers incorporating the residue of a bifunctional 7,7H-dibenzo[c,h]xanthene that can be readily prepared by existing procedures and technology. A further object is to provide novel film-forming linear polyesters, polysulfonamides, polysulfonates, polyester-plysulfonates, and polyurethanes and many other interpolymers comprising 7,7-dimethyl-5,9-7I-I- dibenzo[c,h]xanthylene units useful as supports for photographic elements that are subjected to high temperature processing. Yet, another object is to provide novel photographic elements comprising an improved support material.

These and other objects and advantages of this invention are obtained from a novel class of film-forming condensation polymers with improved physical properties which comprises residues of a bifunctional 7,7- dimethyl-7H-dibenzo[c,h]xanthene having the formula CH CH3 I wherein X is 0-, SO or and Y is R is an alkylene radical, cycloalkylenebisalkylene radical, or arylenebisalkylene radical, R is hydrogen, alkyl radical, ar'alkyl radical or aryl radical.

Useful members of the novel class of polymers of this invention include polyesters, copolyesters, polysulfonamides, copolysulfonamides, polysulfonates, copolysulfonates, polyesterpolysulfonates, and polyurethanes. Generally any material containing functional groups reactive with difunctional units of 7,7-dimethyl-7H- dibenzo[c,h]xanthene may be copolymerized herein. The preferred polymers comprise polyesters, copolyesters, polysulfonamides, copolymers of sulfonamides, polysulfonates and polyesterpolysulfonates.

In one aspect, linear, condensation polymer films made according to this invention can be solvent cast, treated to improve the adhesion of subsequent coatings and coated with photographic compositions. The polymers have improved physical properties such as highglass transition temperatures, chemical and physical stability at high temperature and good flexibility and can be prepared from low-cost starting materials. The resulting photographic elements can be processed at temperatures in excess of 200C, preferably above at least 220C, with very little effect on dimensional sta- I bility of the element.

A preferred embodiment according to this invention Another preferred embodiment relates to linear polysulfonamide materials comprising diamine units reacted with 7,7-dimethyl-7H-dibenzo[c,h]xanthene-5,9-

disulfonyl halide units.

A further preferred embodiment relates to linear polyester materials comprising dicarboxylic units of four or more carbon atoms esterified with diol units comprising 7,7-dimethyl-7H-dibenzo[c,h]xanthene- 5,9-diol units and units of a dissimilar diol.

Another preferred embodiment relates to linear polyester-polysulfonate materials comprising diol units condensed with bis(4-carbomethoxyphenyl)7,7- dimethyl,-7H-dibenzo[c,h]xanthene-5,9-disulfonate units.

A still further preferred embodiment relates to linear polysulfonate materials comprising diol units condensed with sulfonyl halide units comprising 7,7- dimethyl-7H-dibenzo[c,h]-xanthene-5,9-disu1fonyl halide units and units of a dissimilar sulfonyl halide.

Other useful polymers of this invention include linear polyester materials comprising 7 ,7-dimethyl-7H- mers according to this invention include polysulfonate materials comprising 7,7-dimethyl-7H- dibenzo[c,h]xanthene-5,9-disulfonyl halide units condensed with diol units, said polysulfonates having in copolymerized relationship therewith units of one or more dissimilar disulfonyl halides with units of one or more dissimilar diols.

This invention also contemplates polymers comprising 7,7-dimethyl-7I-I-dibenzo[c,h]xanthene 5,9-diol units condensed with sulfonate and carboxylic ester units.

This invention also contemplates novel monomers comprising the 5,9-disulfonyl halide derivative of 7,7-

dimethyl-7H-dibenzo[c,h]xanthene and methods of preparing same. The preferred halide is the chloride.

DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS OF THIS INVENTION The polymers of this invention include 7,7-dimethyl- 7H-dibenzo[c,h]xanthene residue and the polymers are represented by formulas II and III:

R is a radical selected from the group consisting of alkylene radicals of from two to 12 carbon atoms, preferably from two to six atoms, such as ethylene, trimethylene, butylene, hexylene, octylene, decylene and the like; cycloalkylenebisalkylene radicals, such as 1,4- cyclohexylenedimethylene, 1,4- cyclohexylenediethylene and the like; and arylenebisalkylene radicals, such as l,4-phenylenedimethylene, 1,4-phenylenediethylene and the like. Each R, which can be the same or different, is a radical selected from the group consisting of hydrogen atoms, alkyl radicals of from one to four carbon atoms; aralkyl radicals, such as benzyl or phenethyl; and aryl radicals, such as phenyl, including substituted phenyl, such as tolyl, anisyl, phenetyl. Z is S0 or m is l to 100 mole and n is 100m mole The radical R is selected from the group consisting of arylene radicals, such as 0-, m-, or p-phenylene,

'naphthylene, anthrylene, 1,1,3-trimethyl-3-phenylindan-4', S-diyl, substituted or unsubstituted with radicals such as halogen, nitro, cyano, alkyl of one to six carbon atoms, or alkoxy of one to six carbon atoms; arylenebisalkylene radicals, where the alkylene portion comprises one to six carbon atoms, such as phenylenedimethylene, phenylenediethylene, naphthylenedimethylene, naphthylenediethylene and the like; and cycloalkylene radicals, such as cyclopentylene, cyclohexylene, norbornylene, and the like. The radical R is preferably arylene. I

The radical R is selected from the group consisting of alkylene radicals of from two to 12 carbon atoms, cycloalkylene, and arylene radicals such as o-, m-, or p-phenylene, naphthylene anthrylene, and 3,3,3,3'- tetramethyl-l,l-spirobi[indan]-6,6-diyl. It may also be represented by the formula IV:

wherein each R and R which can bethe same or different, are selected from the group consisting of hydrogen atoms, aryl radicals, such as phenyl, including substituted phenyl, halogen atoms, nitro radicals, cyano radicals, alkoxy radicals and the like, and wherein the substituents on the substituted phenyl may be a halogen atom, nitro radical, cyano radical or alkoxy radical. R and R represent aliphatic, monocyclic or bicyclic radicals and can each be hydrogen atoms, alkyl radicals of one to six carbon atoms including substituted alkyl radicals such as fluoromethyl, difluoromethyl, trifluoromethyl, dichlorofluoromethyl, 2-[2,3,4,5-tetrahydro- 2,2-dimethyl-4-oxofur-3-yl]ethyl, and the like; cycloalkyl radicals of from four to six carbon atoms, such as cyclohexyl; and aryl radicals having six to 20 carbon atoms, such as phenyl, 3,4-dichlorophenyl, and 2,4- dichlorophenyl. R and R taken together with the carbon atom to which they are attached can represent a monocyclic, bicyclic or heterocyclic moiety having at least four atoms in the ring.

I A very useful class of linear condensation polymers according to this invention that can be employed as flexible supports for photographic elements subjected to high temperature processing comprises polymers of recurring units having the formula V:

wherein X is S 0 or when X is O, SO R O when X is S0 and when X is sol-@ wherein each of R, R, R and R is aspreviously defined. Y

Another useful class of linear condensation polymers according to this invention that can be employed in the preparation of flexible supports for photographic elements subjected to high temperature processing is represented by the formula VI I CH1 CH3 ln wherein X, Y, and R are as described hereinabove, and R is preferably arylene, and n is an integer of from 5 to 98, preferably 20 to 50.

In formula VI, the 7,7-dimethyl-5,9-7H- dibenzo[c,h1-xanthylene portion comprises from about 20 to about 50 mole percent of the linear copolymer, depending on the properties desired. In general, the higher the proportion of the 7,7-dimethyl-5,9-7H- dibenzo[c,h]xanthylene unit, the higher the glass tran sition temperature (Tg).

Bifunctional 7,7-dimethyl-7H- dibenzo[c,h]xanthenes useful in the practice of this invention include the 5,9-diol, the 5,9-diacetate and the 5,9-disulfonyl chloride derivatives of 7,7-dimethyl-7I-I- dibenzo[c,h]xanthene. These compounds can be prepared by any method suitable for this purpose. A desirable starting material is 7,7-dimethyl-7H- dibenzo[c,h]xanthene which is made, for example, in accordance with the procedure of Sen-Gupta, Journ. Chem. Soc., 1914, page 401 by reacting I-naphthol and acetone in the presence of phosphoryl chloride at about 100C for about 10 minutes. The 5,9-diol is conveniently obtained, in the manner of Sen-Gupta and Tucker said Journal, 557568 (1922), by a two-step process which comprises: (1) dichromate oxidation of 7,7-dimethyl-7H-dibenzo[c,h]xanthene in a suitable solvent such as glacial acetic acid; and (2) reduction of the quinone intermediate with a conventional reducing agent, for example, zinc and glacial acetic acid.

Novel monomers which result in particularly useful polymers comprise 7,7-dimethyl-7H dibenzo[c,h]xanthene 5,9-disulfonyl chloride. Conventional chlorosulfonation procedures can be employed in making the 5,9-disulfonyl chloride derivative of 7,7-

cedure affording good yields of the 5,9-disulfonyl chloride comprises heating 7,7-dimethyl-7I-I- dibenzo[c,h]xanthene-5,9-di(tri-n-pentylammonium sulfonate) and phosphorus pentachloride for about 5 hours at about l0O-l 16C.

As previously pointed out, condensation polymers according to this invention comprise units derived from bisphenols, monocyclic andpolycyclic diols and alkylene glycols. The bisphenols employed in this invention are generally of the structure of formula VII:

( V II) where Rf, R R and R are as defined hereinabove.

Typical useful bisphenols include: Bisphenol A; 2,2- bis(4-hydr0xy-3,S-dichlorophenyl)propane[tetrachlorobisphenol A]; l-phenyl-l ,1 -bis( 4- hydroxyphenyl)ethane; l-( 3 ,4-dichlorophenyl)-1 ,1-

bis(4-hydroxyphenyl)ethane; 2,2-bis(4- hydroxyphenyl)-4-[3-(2,3,4,5-tetrahydro-2,2- dimethyl-4-oxofuryl) ]butane; bis(4- hydroxyphenyl)methane: hydroxyphenyl)-methane; I, l -bis(4-hydroxyphenyl)- cyclohexane; 1,1,1,3,3,3-hexatluoro-2,2-bis(4-hydroxyphenyllpropane; and diphenylbis( 4- hydroxyphenyUmethane.

2,4-dichlorophenylbis(4- Bisphenols of this type are economically attractive since they can generally be produced by the simple reaction mechanism as follows:

()ther useful bisphenols include 1,4-naphthalenediol; 2,5naphthalenediol; bis(4-hydroxy-2-methyl-3- propylphenyl)-methane; l,l '-bis(2-ethyl-4-hydroxy-5- sec.butylphenyl)ethane; 2,2'-bis(4-hydroxy-2-methyl- 5-tert.butylphenyl)propane; 1,1 '-bis(4-hydroxy-2- methyLS-isoctylphenyl)isobutane and bis-(2-ethyl-4-' dodecanediol; neopentyl glycol; 2,2,4-trimethyl-l,6-

hexanediol, and 4-oxa-2,6-heptanediol.'

Dicarboxylic compounds that can be employed to advantage in the practice of this invention include phthalic acid; isophthalic acid; terephthalic acid; t-

butylisophthalic acid; phenylenediacetic acid; phenylenedipropionic acid; 2,6- naphthalenedicarboxylic -acid; 1,4 naphthalenedicarboxylic acid; 1,5- nephthalenedicarboxylic acid; 1,7-

naphthalenedicarboxylic acid; 4,4'-diphenic acid; 4,4'- sulfonyldibenzoic acid; 4,4.'-oxydibenzoic acid; binaphthyldicarboxylic acid; 4,4'-stilbenedicarboxylic acid, and 9,lO-triptycenedicarboxylic acid.

Although the dicarboxylic acids useful in the practice of this invention can be employed in the free acid form, it is often more advantageous to utilize a bifunctional derivative thereof. For example, the corresponding acid anhydrides may be used where they are available.

Other useful bifunctional equivalents include the lower monohydric alcohol and phenyl esters of dicarboxylic acids and the dicarboxylic acid halides, e.g. the chlorides or bromides.

The molecular weight of the linear condensation polymers of this invention can vary over wide ranges,

' although we have found that polymers having a molecular weight of at least 10,000 are useful. Linear polymeric compounds having molecular weight from about 15,000 to 50,000 are particularly desirable. The compounds of this invention are further characterized by their inherent viscosities. Generally, the subject filmforming polymers have an inherent viscosity of about 0.4 to about 1.2 and the polymers preferred as supports for photographic elements processed at high temperatures have an inherent viscosity of about 0.6 to about 0.8. The inherent viscosities herein reported are measured at 25C at a concentration of 0.25g of polymer per 100 ml of solution. Unless otherwise specified, a solution of equal parts by weight of phenol and chlorobenzene is employed.

The glass transition temperatures of the polymers of this invention can be determined by differential scanning calorimetry as disclosed in The DSC Cell and Accessories Instruction Manual for the 900 Thermal Analyzer and Modules, sold by E. l. duPont de Nemours Instrument Products Division.

Film-forming as used in this invention refers to a material which will provide a self-supporting film of the material when cast or extruded, for example, when cast in sheets of from 1 to 7 mils thickness.

It is appreciated, of course, that the physical properties of the broad class of novel polymers of this invention such as, for example, the glass transition-temperature (Tg), yield strength, break strength, Youngs modulus and the like, can be varied over a wide range. Polymers with properties in a particular range can be easily obtained by judicious selection of appropriate diol didibenzo[c,h]xanthene-5,9 disulfonyl chloride units and from about 75 to about 25 mole percent dissimilar disulfonyl chloride units. These polymers contain recurring residues of a 7,7-dimethyl-7H- dibenzo[c,h]xanthene having 5,9-bis-sulfonamido groups.

Examples of diamines which may be used to condense with disulfonyl halide units herein are:

m, and p-phenylenediamine ethylenediamine o, N-ethylethylenediamine 2,4-diaminotoluene N,N-diethylethylenediamine 2,S-diaminotoluene N-methylethylenediamine 2,6-diaminotoluene l.2-propanediamine 3,4-diaminotoluene l,3-propanediamine 2,3-diaminofluorene N-methyl-l ,3-propanediamine 2,5-diaminofluorene l,4-hutanediamine 2,7-diaminofluorene I ,S-pentanediamine l,2-diaminonapl1thalene l.6-hexanediamine 1,5-diaminonaphthalene -heptanediamine 1,8-diaminonaphthalene -octanediamine 2,3-diaminonaphthalene 0-decanediamine Z-dodecanediamine N-cyclohexyl-l ,3-propanediamine A very valuable class of polymeric polysulfonates of i this invention comprises units of a bisphenol condensed 7,7-dirnethyl-7H- at the 1,2, the 1,3, the 1,4, the 1,5, the 1,6, the 1,7, the 2,6, and the 2,7 positions respectively.

A highly desirable class of polymeric polyesters in accordance with this invention comprises units of terephthalic acid esterified with diacetate units which comprise from about to about 80 mole percent 7,7- dimethyl-7I-I-dibenzo[c,h]xanthene-S,9-diacetate units and from about 80 to about 20 mole percent bisphenol diacetate units.

As indicated hereinabove, the preferred linear condensation polymers of this invention include polysulfonamides, polysulfonates, polyesters and polyesterpolysulfonate units. Other polymers may include polyurethanes, polyimides and the like. Generally any procedure known in the art for making linear condensation polymers can be used for preparing these polymers. The following are examples of processes that may be utilized to produce linear polymers of this invention.

a. The interfacial procedure can be utilized to make the polymers. A preferred embodiment with regard to the materials, solvents and catalysts is shown in Example 3. The preferred time of reaction is a function of allother variables and, as such, is governed by the viscosity desired for the polymer. Generally, the reaction can be monitored by sampling and thus the preferred polymerization time chosen. A variety of solvents may be employed to provide a broader range of reaction temperatures and solubilities as desired. Suitable solvents include methylene chloride, chloroform, carbon tetrachloride and the like.

b. Polymers according to this invention can be prepared by a solution procedure whereby a bifunctional derivative of 7,7-dimethyl-7H-dibenzo[c,h]xanthene, for example, the 5,9-disulfonyl chloride, and the coreactant(s), for example an alkylene diamine, are placed in solution in the presence of an acid acceptor such as, for example, pyridine. The acid acceptor can be present in excess and thus serve also as a solvent.

c. The ester interchange procedure of synthesizing polymeric esters both by the melt process and the powder process can advantageously be used to make the polymers of this invention, particularly for those copolymers which can be crystallized. Example 11 is illustrative of this technique. This procedure affords flexi-' ble film-forming polymers having improved physical properties including high softening temperatures and high molecular weights. The melt process is advantageously conducted in the presence of a catalytic agent. Useful catalysts for the transesterification reactions include the carbonate, oxide, hydroxide, hydride-and alkoxide of an alkali metal or an alkaline earth metal, a compound of a Group IVA metal of the Periodic Table, e.g., titanium isopropoxide, organometallic halides and complex alkoxides such as l IaHTi(OC H,,) and the like.

The film-forming materials of this invention can be generally extruded or cast into flexible supports and used in various layer arrangements and structural combinations. Generally, the flexible supports of this invention are treated by any convenient method to improve the adhesion of superimposed coatings or layers. Useful procedures include subbing with conventional subbing agents for polymer supports, contacting with a chemical agent such as sulfuric acid, corona discharge, treating with a reactive gas according to the procedure of Lidel, U.S. Ser. No. 80,482, filed Oct. 13, 1970 and Belgian Patent No. 736,993, and the like. The filmforming polymers of this invention are used to advantage as flexible supports for photographic silver halide and other light-sensitive systems as well as for multilayer elements used in color photography and diffusion transfer processes.

In a preferred embodiment, a support of a polymer of this invention is used as the film support in photographic elements which are heat-processed or heatstabilized. In particular, one preferred embodiment relates to photographic elements comprising the supports of this invention having at least one layer of a photographic emulsion which contains silver halide grains having polyvalent ions occluded therein as disclosed in Bacon et a1., U.S. Pat. No. 3,447,927. Elements of this type can be processed according to Colt, U.S. Pat. No. 3,418,122, issued Dec. 24, 1968.

The following examples illustrate the preparation of the polymers of this invention.

EXAMPLE 1 Preparation of 7,7-Dimethyl-7H-dibenzo[c,h]xanthene-5,9- di(potassium sulfonate) Chlorosulfonic acid, 42 ml (g, 0.644 mole) is added to a solution of 50g (0.161 mole) of 7,7- dimethyl-7H-dibenzo[c,h]xanthene in 250 ml of chloroform over a 10 minute period with external cooling to maintain a reaction temperature of 10 to 30C. The insoluble complex is collected and washed well with chloroform. This solid is then added to a solution of 56g (1.0 mole) of potassium hydroxide in 500 ml of ethanol. The white solid which forms is collected,

washed with ethanol and dried. The dried solid is slurried in 1.0 liter of boiling ethanol, collected and dried again. The yield of solid is 95.5g; mp is-above.300C.

The IR. spectrum and the NMR spectrum indicate that the product comprises 7,7-dimethyl-7H- dibenzo[c,h]xanthene'5,9-di(potassium sulfonate) and a small amount of inorganic potassium salts.

EXAMPLE 2 The NMRand IR. spectra of the first crop material support the proposed structure. 1

A repetition of the immediately described procedure affords a combined first and second crop yield of 51.5%.

EXAMPLE 3 ate, 50 ml of distilled water and 4 ml of a twenty percent solution of Duponol ME (sodium lauryl sulfate, manufactured by E. I. du Pont de Nemours Co.) in water. To this stirred solution is added a solution of 253g mole) of 7,7-dimethyl-7H- dibenzo[c,h]xanthene-5,9-disulfonyl chloride, prepared in the manner of Example 2, in 100 ml of chloroform. The mixture is stirred for 35 minutes. At this time, the mixture is poured into 1400 ml of methanol precipating the polymer. The polymer is collected and dried. The inherent viscosity is 0.35 and the Tg is 206C.

The procedure of Example 3 is repeated except that the 1,6-hexanediamine is replaced by equivalent amounts of other diamines. The compounds employed and the physical properties of the resultant polymers are set out in Table 1 below.

7,7-Dimethyl-7H-dibenzo[c,h]-xanthene-5,9- disulfonyl chloride and 1,6-l-lexanediamine. Solution Process In a 100 ml three-neck flask equipped with a stirrer, thermometer and condenser is placed a solution of 058g (0.005 mole) of 1.6-hexanediamine,' 2.53g (0.005 mole) of 7,7-dimethyl-7H- dibenzo[c,h]xanthene-5,9-disulfonyl chloride and 100 ml of pyridine. The solution is heated from room temperature to 85C over a 4-hour period. The solution is then poured into 1,500 ml of 4zlmethanolzwater, and the polymer is collected and dried. The inherent viscosity is 0.17.

EXAMPLE 9 Polymerization of 7,7-Dimethyl-7H-dibenzo[c,h]xanthene-5,9-disulfonyl Chloride and 4,4-Isopropylidenediphenol. Interfacial Process In a blender is placed 1.14g (0.005 mole) of 4,4- isopropylidenediphenol, 22 ml (0.011 mole) of 0.5 N NaOH, 28 ml of distilled water and one drop of tri-nbutylamine. To this solution is added a solution of 253g (0.005 mole) of 7,7-dimethyl-7H- dibenzo[c,h]xanthene-5,9-disulfonyl chloride in 150 ml of methylene chloride. The mixture is stirred for 2 hours and 45 minutes adding 50 ml of 1,2

dichloroethane after 1 hour and 25 minutes of reaction. At the end of this time, 5 ml of acetic acid is added and the mixture is poured into 1400 ml of methanol. The polymer is collected and dried at 50C for 17 hours. The inherent viscosity in chloroform is 0.07 and the Tg is 220C.

EXAMPLE 10 Polymerization of 7,7-Dimethyl-7H-dibenzo[c,h]xanthene-5,9-disulfonyl Chloride, 1,3-Benzenedisulfonyl Chloride and 4,4-Isopropylidenediphenol. 50:50 Interfacial Process In a blender is placed 228g (0.01 mole) of 4,4- isopropylidenediphenol, 44 ml (0.022 mole) of 0.5 N NaOH, 56 ml of distilled water and two drops of tri-nbutylamine. To this solution is added a solution of 2.53g (0.005 mole) of 7,7-dimethyl-7l-1- dibenzo[c,h]xanthene-5,9-disulfonyl chloride and 1.37g (0.005 mole) of 1,3-benzenedisulfonyl chloride in 100 ml of chloroform. The mixture is stirred for 3 hours and 35 minutes. After 1 hour and 40 minutes of reaction, 50 ml of additional chloroform is added. After completion of this stirring, 5 ml of acetic acid is added and the mixture is poured into 1500 ml of methanol. The polymer is collected and dried at 50C for 17 hours. The inherent viscosity in chloroform is 0.1 1 and the Tg is 160C.

EXAMPLE 1'1 Polymerization of 7,7-Dimethyl-7H-diben2o[c,h]xanthene-S,9-diacetate, 2,2-Bis(p-acetoxyphenyl)propane and Terephthalic Acid. 30:70 Melt Process In a polymer flask equipped with a nitrogen inlet tube, and a Vig'reux-Claissen adapter is placed 060g (0.0014 mole) of 7,7-dimethyL7H-dibenzo[c,hlxanthene-5,9-diacetate, 1.03g (0.0033 mol'e) of'2,2-bis(pacetoxyphenyl)propane, 0.78g (0.0047 mole) of terephthalic acid and a catalytic amount of dibutyltin oxide. With nitrogen bubbling through the reaction mixture, the flask is heated from 265C to 300C over a 1% hour period. The polymer is then isolated, ground to a powder and heated in a polymer flask at 300C at 0.10 mm pressure for 3 hours. The polymer is then removed from the reaction flask. The inherent viscosity is 0.60 and the Tg is 299C.

EXAMPLE 12 Preparation of Bis( 4-carbomethoxyphenyl)7,7-dimethyl-7H- dibenzo[c,h]xanthene-5 ,9-disulfonate .lected, dried and recrystallized again from 300 ml of methyl ethyl ketone giving 12.8g (17.3%) of bis(4- carbomethoxyphenyl)7,7-dimethyl-7H- dibenzo[c,h]xanthene- ,9-disulfonate; m.p.=209-210.5C.

EXAMPLE 13 Polymerization of Bis(4-carbomethoxyphenyl) 7,7-Dimethyl-7H-dibenzo[c,h]xanthene-5,9- disulfonate and Ethylene Glycol A mixture of 6.40g (8.67 X mole) of bis(4-carbomethoxyphenyl) 7,7-dimethyl-7H- dibenzo[c,h]xanthene-5,9-disulfonate and 200g (3.22

10 mole) of ethylene glycol is treated with a cata- EXAMPLE 14 Polymerization of Bis(4-carbomethoxyphenyl) 7,7-Dimethyl-7H-dibenzo[c,h]xanthene-5,9 disulfonate and 1,4-Cyclohexanedimethanol This polymer is prepared in the manner of Example 13 from a mixture of 6.40g (8.67 X 10 mole) of his (4-carbomethoxy-phenyl) 7,7-dimethyl-7H- dibenzo[c,h]xanthene-5,9-disulfonate and 2.50( 1.73 X 10" mole) of 1,4-cyclohexanedimethanol and employing a catalytic amount of zinc acetate dihydrate and antimony (Ill) oxide. Inherent viscosity is 0.24 and Tg is 191C.

It has been mentioned previously that the condensation polymers of this invention are employed to advantage in the preparation of flexible films. Certain of these films, prepared from polymers of this invention that have glass transition temperatures above about 200C, and preferably above 220C, are especially useful as flexible supports for photographic elements that are processed at high temperatures.

A convenient procedure for converting a polymer of this invention to film form is the well-known method of solvent casting, although other commonly used methods such as extrusion may be employed. Film formation by solvent casting and the preparation of a photographic product for high temperature processing are typically illustrated by Examples 15 and 16 respectively.

EXAMPLE 15 A solution in 20 ml tetrahydrofuran of 1.7g of polysulfonamide polymer prepared from 7,7-dimethyl-7H- dibenzo[c,h]xanthene-5,9-disulfonyl chloride and 1,6-

hexanediamine in the manner of Example 3 and having EXAMPLE 16 A strip of-the film prepared in Example 15 is treated according to the procedure of Lidel referred to hereinabove. to promote adhesion of the photographic emulsion that is applied in the next step..The treated strip is coated with a light-sensitive printout emulsion prepared according to the procedure of Bacon referred to hereinabove. The emulsion coating has a thickness of 4 mils. The dried, coated silver halide emulsion adheres well to the treated film support as evidenced by a cellophane tape test.

In this test, the dry coated emulsion layer is scored in a cross-hatch pattern and a piece of cellophane tape is pressed firmly over the scored area. The tape is then strippedquickly from the film. If the bond between the emulsion layer and film is strong, the emulsion layer is not removed from the film by the tape. A weak bond facilitates removal of the emulsion layer by the tape.

it will be appreciated that any conventional procedure for promoting adhesion of a photographic emulsion could be used. Typical procedures include corona treatment, chemical treatment, suitable subbing layers, and the like.

Films prepared from the linear condensation polymers of this invention are highly useful as flexible supports for photographic silver halide emulsions which must be processed at elevated temperatures. Similarly, films prepared from the polymers of this invention can be employed as flexible supports for light-sensitive photographic elements that are processed solely by the application of heat. The polymers of this invention find further use as supports for light-sensitive colloid layers such as are employed in image transfer processes, in lithography, and the like. The high temperature characteristics and dimensional stability of the subject polymers make them suitable as supports for photoresists such as these utilized in the preparation of printed circuits, and the like. Additionally, the polymeric compositions of this invention can be solvent cast, extruded or molded and are therefore useful as fibers, as components of tire cord, lacquers, molding resins, engineering plastics and the like.

Polymeric compositions according to this invention are advantageously prepared by standard techniques using well-known industrial processes. The compounds employed in making the polymers of this invention are prepared from readily available, inexpensive materials. A further advantage of the polymers of this invention is that they may be readily formed into film using procedures compatible with commercially available equipment.

The invention has been described in detail with particular reference to preferred embodiments thereof, but it will be understood that variations and modifications can be effected within the spirit and scope of the invention.

We claim:

l. A film forming polymer having a glass transition temperature greater than 200C comprising recurring units having the formula 1:

i cm wherein X is SO 'or SO;, R when X is S0 or wherein X is O and Y is 0 a V oil-mail:

Z is S0 or m is l to 100 mole percent and n is lOO-m mole percent; R is a radical selected from the group consisting of alkylene radicals of from two to 12 carbon atoms, cycloalkylenebisalkylene radicals and arylenebisalkyarylene radicals wherein the substituents are halogen,

nitro, cyano, alkoxy of one to six carbon atoms and alkyl radicals of one to six carbon atoms, and arylenebisalkylene radicals having one to six carbon atoms in the alkylene portion, and each R, which can be the same or different, is'a radical selected from the group consisting of alkylene radicals of from two to 10 carbon atoms, cycloalkylene, arylene radicals, and substituted arylene radicals wherein the substituents are halogen, nitro, cyano, alkyl of one to six carbon atoms, and alkoxy of one to six carbon atoms. 2. A film of a polymer as defined by claim 1.

3. A polymer according to claim 1 wherein X is S0 4. A polymer according to claim 1 wherein X is O.

5. A polymer according to claim 1 wherein X is 6. A film forming polymer having a glass transition temperature greater than 200C. comprising recurring units having the formula:

wherein R is a radical selected from the group consisting of cycloalkylene radicals, arylene radicals, substi-- tuted arylene radicals, wherein the substituents are halogen, nitro, cyano, alkoxy of one to six carbon atoms and alkyl radicals of one to six carbon atoms, and arylenebisalkylene radicals having one to six carbon atoms in the alkylene portion; each R, which can be the same or different is a radical selected from the group consisting of alkylene radicals of from two to 10 carbon atoms, cycloalkylene, arylene radicals, and substituted arylene radicals wherein the substituents are halogen, nitro, cyano, alkyl of one to six carbon atoms, and alkoxy of one to six carbon atoms; m is l to mole percent andn is 100-m.

7. A film forming polymer having a glass transition temperature greater than 200C. comprising recurring units having the formula:

CH3 CH3 8; A film forming polymer having a glass transition 10 cyano radicals, alkoxy radicals and substituted phenyl temperature greater than 200C. comprising recurring wherein the substituents can be halogen, cyano; nitro units having the formula: and alkoxy, and R and R are selectedfrom the group consisting of hydrogen atoms, radicals of from one to six carbon atoms, fluoromethyl, difluoromethyl, trifluoromethyl, dichlorofluoromethyl, 2-[2,3,4,5-tetrahydro- 2,Z-dimethyl-4-oxofur-3-yl]ethyl radicals, cycloalkyl \/O\/ radicals, and aromatic radicals of from six to carbon y -ois- 12. A film forming linear polymer having a glass tran- 20 sition temperature greater than 200C. having the for- CH3 CH3 mula:

wherein R is a radical selected from the group consisting of alkylene radicals of from two to 12 carbon I atoms, cycloalkylenebisalkylene radicals and ar- I Q\ lyenebisalkylene radicals.

9. A film forming polymer having a glass transition U temperature greater than 200C. comprising recurring W II II units having the formula: 00cm 0 J ClI: Clla wherein m is l to 100 mole percent and n is0 orlOO-m wherein each R which can be the same or different, mole percent. is a radical selected from the group consisting of cyclo- 10. A film forming polymer having a glass transition alkylene radicals, arylene radicals, substituted arylene temperature greater than 200C. comprising recurring radicals wherein the substituents are halogen, nitro, cyunits having the formula: ano, alkoxy of one to six carbon atoms and alkyl radi- CH3 CH3 I11 wherein m is l to 100 mole percent and n is 0 or 100-m cals of two to six carbon atoms, and arylenebisalkylene mole percent. 5 radicals having one to six carbon atoms in the alkylene 11. A film forming polymer according to claim 1 portion. wherein R is presented by the fomula: 13. A film forming linear polymer having a glass transition temperature greater than 200C. having the formula:

wherein each R and R which can be the same or different, are selected from the group consisting of hydrogen atoms, aryl radicals, halogenatoms, nitro radicals,

' trifluoromethyl,

wherein R is a radical selected from the group consisting of alkylene radicals of from two to 10 carbon atoms, cycloalkylene, arylene radicals, and substituted arylene radicals wherein the substituents are halogen, nitro, cyano, alkyl of one to six carbon atoms, and alkoxy of one to six carbon atoms, and radicals represented by the formula:

R4 l 1 Q v t t vBL wherein R and R which can be the same or different, are selected from the group consisting of hydrogen atoms, aryl radicals, halogen atoms, nitro radicals,-

i l Tii oas CH3 CH:

wherein R is a radical selected from the group consisting of alkylene radicals of from two to l0 carbon atoms, cycloalkylene, arylene radicals, and substituted arylene radicals wherein the substituents are halogen, nitro, cyano, alkyl of two to six carbon atoms, and alkoxy of one to six carbon atoms, and radicals represented by the formula:

wherein R and R which can be the same or different, are selected from the group consisting of hydrogen atoms, aryl radicals, halogen atoms, nitro radicals,-

' cyano radicals,alkoxy radicals, and substituted phenyl wherein the substituents can 'be halogen, cyano, nitro and alkoxy, and R and R are selected from the group consisting of hydrogen atoms, alkyl radicals of from one to six carbon atoms, fluoromethyl, difluoromethyl, trifluoromethyl, dichlorofluoromethyl, 2-[2,3,4,5- tetrahydro-2,2-dimethyl-4-oxofur-3-yl]ethyl radicals, cycloalkyl radicals, and aromatic radicals of from six to 20 carbon atoms. 

1. A FILM FORMING POLYMER HAVING A GLASS TRANSITION TEMPERATURE GREATER THAN 200*C COMPRISING RECURRING UNITS HAVING THE FORMULA 1:
 2. A film of a polymer as defined by claim
 1. 3. A polymer according to claim 1 wherein X is SO2.
 4. A polymer according to claim 1 wherein X is O.
 5. A polymer according to claim 1 wherein X is
 6. A film forming polymer having a glass transition temperature greater than 200*C. comprising recurring units having the formula:
 7. A film forming polymer having a glass transition temperature greater than 200*C. comprising recurring units having the formula:
 8. A film forming polymer having a glass transition temperature greater than 200*C. comprising recurring units having the formula:
 9. A film forming polymer having a glass transition temperature greater than 200*C. comprising recurring units having the formula:
 10. A film forming polymer having a glass transition temperature greater than 200*C. comprising recurring units having the formula:
 11. A film forming polymer according to claim 1 wherein R3 is presented by the fomula:
 12. A film forming linear polymer having a glass transition temperature greater than 200*C. having the formula:
 13. A film forming linear polymer having a glass transition temperature greater than 200*C. having the formula:
 14. A film forming linear polymer having a glass transition temperature greater than 200*C. having the formula: 